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keramični cilj Rotacijski AZO cilj - Magnetronska cilja
O tem izdelku
Kemijska sestava: AZO
Postopek oblikovanja: CIP+Sintering+Bonding
Čistost: ≥5.4g/cm3
Gostota: ≥ 99.95%
Uporaba: Široko se uporablja v elektrodnih filmih tankoslojnih sončnih celic, filmih z nizko emisivnostjo
Maksimalna velikost obdelave
D 4000MM T 5MM
Ravno & Pasja kost
Prilagojeno specifikacijam strank
Čistost: ≥5.4g/cm3
Gostota: ≥ 99.95%
PreverjenoXIAMEN NINESUN IMP. & EXP. CO., LTD
No.78 Biyun Zhong Lu, Hongtang Town, Xiamen 361000
Kitajska
Ustanovljeno: 1992
Vrsta dobavitelja
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ProizvodnjaPodobni izdelki
1/15
Podobni izdelki
1/15
keramični cilj Rotacijski AZO cilj - Magnetronska cilja